E1-M high resolution two-dimensional material metallographic microscopic transfer system

E1-M high resolution two-dimensional material metallographic microscopic transfer system

【Numbering】BK2020052960 【CAS】
【Item No.】 【specification】

2020525145455710.pdf

5 minutes to choose the product plan

E-mail:beikenano@gmail.com




E1-M is suitable for the precise point transfer of single-layer materials such as graphene, molybdenum sulfide and black phosphorus, and the preparation of multi-layer van der Waals heterojunction, which realizes the visualization operation of low-dimensional material transfer. The transfer system consists of a microscopic system, a three-axis transfer table, and a vacuum adsorption heating integrated sample stage. The target substrate stage can be rotated at a large angle in the surface, which is a powerful tool for studying the characteristics of heterojunction, the symmetry breaking of spatial inversion, and the influence of different stacking methods of two-dimensional materials. High stability, high precision mechanical design and high quality microscopic imaging system enable precise transfer of small samples of less than 5 μm.

Based on the excellent transfer operation of E1-T, E1-M has improved the resolution of monolayer, multilayer and van der Waals heterojunction observations through the upgrade of Olympus metallographic microscope optical system. Rate and clarity, perfect integration of observation, transfer, imaging recording and other device preparation process operations. E1-M also has a variety of configuration options, including sample stage high temperature module, Raman test module, fluorescent test module, etc., with a damped optical shockproof platform, and supports the installation environment in the glove box.


Main configuration*

Substrate carrier platform XY direction two-axis translation, stroke 60mm; manual adjustment rotation around the z-axis ±90°; sample table heating maximum temperature is 150 °C; sample table with sample vacuum adsorption function
Slide moving platform XY direction two-axis translation, stroke 60mm; Z-axis lifting slide, stroke 10mm; tilting table around X-axis and Y-axis, tilt angle ± 2°; fast rotary sample introduction device
Microscope Olympus BX46 microscope body; wide field of view is like a trinocular tube; in situ 1X, 2X intermediate zoom; 4 times, 10 times, 20 times, 40 times 4 objective lenses, 2 10X eyepieces
Micro Camera 12 Megapixel USB 3.0 Ultra HD CMOS Microscope Camera; Provides Micro Camera Operation Software
Lighting system Reflective coaxial lighting system, 1W white LED
Control cabinet system electrical control integration, control sample table heating, adsorption function, control micro-lighting brightness adjustment
Computer i3 processor, 8G memory, 1T hard drive, 23-inch high-definition display
Optional function Slider mobile platform electric Z-axis module, sample stage high temperature module, glove box installation environment, supporting damping optical anti-vibration platform
* Please download the detailed configuration file for detailed parameters.


The standard configuration

The E1-M system consists of four subsystems: a substrate carrier platform adjustment subsystem, a slide mobile platform adjustment subsystem, a micro imaging subsystem (microscope, reflective coaxial illuminator, focus controller, camera), Circuit control subsystem.

The substrate loading platform is manually translated by two axes in the XY direction with a stroke of 60 mm; the rotation of the z-axis is manually adjusted by ±90°, with coarse and fine adjustment, the rotation accuracy is up to ±1°; the maximum temperature of the sample stage is 150 °C; The sample stage with sample vacuum adsorption ensures precise positioning of the target sample during transfer. The vacuum pump can be controlled by a solenoid valve with a vacuum pump flow rate of 50 L/min.


The slide moving platform xyz is adjustable in three axes, XY stroke 60 mm, micro screw control; Z axis travel 10 mm, resolution 0.01 mm; horizontal tilt angle adjustment ± 2 °, used to adjust the substrate and load during transfer The parallelism of the sample on the slide; and has a fast rotary sampler.

The micro imaging system consists of a microscope, a reflective coaxial illuminator, a focus control, and a camera. The Olympus BX46 illuminator bracket is equipped with an in-situ intermediate barrel zoomer (1x, 2x), which enables the image in-situ 2-speed adjustable magnification without changing the objective magnification. The objective lens uses a 4, 10 times long working distance achromatic objective lens, 20, 40 times long working distance flat field semi-apochromatic objective lens. The 12 megapixel USB 3.0 Ultra HD CMOS micro camera provides micro camera operation software for photo capture, video recording, sample size measurement, and split screen comparison.




40 times compensation objective


When the ordinary objective lens is used to observe the sample under the slide, it is affected by the thickness of the slide and PDMS, and aberration will occur. In order to further improve the imaging clarity under high magnification objectives, the E1-M transfer platform is optimized for microscopic observation of the material under the slide to ensure the observation under high magnification.

Optional function

Option 1: Sample stage high temperature module

Option 2: Slider mobile platform electric Z-axis module

        The electric Z-axis uses an imported motor and controller with a stroke range of 13 mm and a minimum stroke accuracy of 0.5 um. Speed multi-speed optional, with continuous travel function and single walk-in function, suitable for slow junction of heterojunction, automatic fit in glove box, etc. By precisely controlling the Z-axis movement speed, the interlayer bubbles formed during the transfer of the heterojunction can be reduced, and the fine control of the Z-axis in the glove box can be achieved.

Option 3: Installation in the glove box


对于某些特殊的对环境要求高的材料如钙钛矿等的转移可配备转移系统手套箱内使用环境安装。


选配四:配套阻尼式光学防震平台




Supporting damped optical anti-vibration platform to reduce environmental disturbance under high-speed operation (length and width 900*600*100mm table length and width 600*600*100mm table top and other specifications)




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