Fluoride-free UV-assisted etching of multilayer Mo2C

Fluoride-free UV-assisted etching of multilayer Mo2C

【Numbering】BK2020070902 【CAS】CAS
【Item No.】BK2020070902-03 【specification】
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product information:
Name: UV-assisted etching of multilayer Mo2CTx
Size: 1-5um
Number of layers: 10-20 layers
Product performance: high purity and excellent electrochemical performance
Functional group: -OH-F-O-Cl (customizable)
Purity: 99%
Storage conditions: room temperature and dry
Process: freeze drying
Specific details: The new UV-assisted selective etching method can etch Ga atoms in the Mo2Ga2C precursor to obtain fluorine-free Mo2C MXene, and avoid the use of toxic and highly corrosive acids. The obtained MXene exhibits a unique 2D graphene-like structure and high purity. When used as a negative electrode material for rechargeable batteries, it exhibits outstanding rate performance and cycle stability. The lithium storage capacity can be stabilized at about 150 mAh g-1, while the sodium storage can be stabilized at about 50 mAh g-1 . In addition, the flexible Mo2CMXene-based battery has outstanding capacity retention rates (89% and 74%). Therefore, this kind of MXene shows great potential in ion storage applications, and this green synthesis method can expand other MXene synthesis ideas, which is of great reference significance.
Application areas: energy storage, catalysis, analytical chemistry, mechanics, adsorption, biology, microelectronics, sensors, etc.
Size craft can be customized


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