5 micron silicon-based silicon dioxide interdigital gold electrode photoelectric detection sensor chip MEMS high precision
1. The electrode substrate is monocrystalline silicon, and silicon dioxide is grown on the surface of the silicon wafer with a thickness of 300nm; dimensions:
4mm*6mm*0.52mm.
2. Line width: 5um, line spacing: 5um, finger length: 1.5mm, interdigital logarithm: 120 (240 finger).
3. Metal layer structure: Cr/Au, thickness of 10nm, 100nm respectively;
4. Electrode operating temperature range: -150℃~500℃;
5. Mainly used in various chemical, physical and medical sensors, with reliable performance and stable quality.
6. Large quantity and price favorably.
We provide various interdigital electrodes. Including different shapes, different sizes, different line widths and distances, different substrates (alumina ceramics, PI/PET flexible materials, single crystal silicon), and different processes (thick film process, DPC process, MEMS process) .
Warm tips: Suzhou Beike nano products are only used for scientific research, not for human body,different batches of products have different specifications and performance |
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Warm tips: Suzhou Beike nano products are only used for scientific research, not for human body,different batches of products have different specifications and performance.The website pictures are from the Internet. The pictures are for reference only. Please take the real object as the standard. In case of infringement, please contact us to delete them immediately. |